Compiled from the following sources:

Special biographic research
Wen Wei Publishing Company, Ltd. 2002-2006

Who's Who, Current Chinese Leaders
Wen Wei Publishing Company, Ltd. 2003-2005

Revision History:

Biography Revised: 6/9/2003
Career Data Updated: 4/18/2006

PHOTO: Zou Shichang
Zou Shichang 邹世昌
Material Scientist

Biography

Zou Shichang, male, Han nationality, is a native of Taichang, Jiangsu Province, and was born in Shanghai. He graduated from Jiaotong University in 1952 and received his doctorate from the Moscow Non-Ferrous Metal Institute in 1958.

Zou Shichang presided over national defense through the processing and formation of the first separation membrane and decided on the optimization of technical channels in the 1960s. He systematically studied the interaction of ion beams and solids and the modification, composition, processing and analyses of ion beam materials.

Zou initiated the strengthened annealing effect of ion implantation injuries caused by the CO2 laser back irradiation. He manufactured the 1st 120-gate gallium arsenide gate-array circuit in China and processed the first flash holographic grating by using reaction ion beams. He also researched SOI material and manufactured certain types of SOI circuits. Zou developed ion beam increase deposit technology and synthesized silicon nitride and titanium nitride membranes.

Zou is an academician of the Chinese Academy of Sciences.

Career Data

1992—1997 Alternate Member, 14th CPC, Central Committee
1991— Academician, Chinese Academy of Sciences
Researcher, Chinese Academy of Sciences, Shanghai Metallurgical Research Institute Shanghai Municipality
1958 Graduate, Moscow Non-Ferrous Metal Institute Russia, Moscow (Received Assistant Doctorate)
1952 Graduate, Tangshan Jiaotong University, Mining and Metallurgical Department Hebei Province, Tangshan City


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